Date: Fri, 29 Mar 2024 02:54:57 -0600 (MDT) Message-ID: <1437855782.2879.1711702497061@nf-sv-confluence01.nanofab.ualberta.ca> Subject: Exported From Confluence MIME-Version: 1.0 Content-Type: multipart/related; boundary="----=_Part_2878_1492736814.1711702497060" ------=_Part_2878_1492736814.1711702497060 Content-Type: text/html; charset=UTF-8 Content-Transfer-Encoding: quoted-printable Content-Location: file:///C:/exported.html
The nanoFAB operates a Heidelberg DWL-200 to fabricate 5" =C3=97 5" and = 7" =C3=97 7" photomasks suitable for pattern transfer using contact photoli= thography techniques. We offer photomask fabrication as a service only, use= rs cannot be trained to operate the pattern generator. Photomasks will be f= abricated and shipped according to the policies below.
Dimensions
Mask size | Lens | Academic | External |
---|---|---|---|
5=E2=80=B3 =C3=97 = 5=E2=80=B3 | 10 mm | $195 | $447 |
7=E2=80=B3 =C3=97 = 7=E2=80=B3 | 10 mm | $381 | $874 |
5=E2=80=B3 =C3=97 = 5=E2=80=B3 | 4 mm | $442 | $1013 |
7=E2=80=B3 =C3=97 = 7=E2=80=B3 | 4 mm | $863 | $1979 |