Productma-N 2400 Negative Tone Photoresist Series
Manufacturermicro resist technology GmbH
Composition

30–60% anisole, 30–60% cyplopentanone, phenolic resin (novolak), bisazide (photoactive compound); liquid

Synonyms

ma-N

Typical UsesElectron-beam lithography resist (negative tone)
Hazards

2 0 3 Flammable Less serious health effects

Skin corrosion/irritation Category 2 , Serious eye damage/eye irritation Category 2A , Flammable liquids Category 3

StorageCabinet 6 (flammables cabinet in aisle 2)
DisposalSolid: Organic waste / organic sharps waste containers in primary or secondary litho areas.  Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A.
CommentsSpin-coat and bake using Brewer Spinner & Hotplate or Laurell Spinner in Aisle 1 Fumehood
Status


Check First

Please contact a nanoFAB staff member for uses not listed above.