| Product | Manganese iridium (sputtering target) |
|---|---|
| Manufacturer | ACI Alloys Inc. |
| Composition | 80% manganese, 20% iridium; solid |
| Synonyms | MnIr |
| Typical Uses | Thin-film material deposited via sputtering. |
| Hazards |
Specific target organ toxicity – repeated exposure Category 2
|
| Storage | Precious metals target cabinet. |
| Disposal | Collected for precious metals reclamation. |
| Comments | Avoid dust formation. Avoid breathing dust. Wear gloves when handling. Approved for sputtering in Sputtering System #4 (Moe). |
| Status | RESTRICTED USE |
Check First
Please contact a nanoFAB staff member for uses not listed above.