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Manganese iridium (sputtering target)

ManufacturerACI Alloys Inc.
Composition80% manganese, 20% iridium; solid
Typical UsesThin-film material deposited via sputtering.

0 0 0  

Not a hazardous substance or mixture.

StorageSputtering target cabinet next to Sputtering System #4 (Moe).
DisposalRegular garbage bins in 10k area or cleanroom.
CommentsApproved for sputtering in Sputtering System #4 (Moe).


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Please contact a nanoFAB staff member for uses not listed above.