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ProductAZ P4330-RS photoresist

EMD Performance Materials Corp.

Composition65–70% 1-Methoxy-2-propanol acetate, 1–5% Diazonaphthoquinonesulfonic ester, <0.3% 2-Methoxy-1-propanol acetate25–30% Cresol novolak resin; liquid
Typical UsesPhotoresist for thick film applications

2 0 2   Flammable Less serious health effects

Serious eye damage/eye irritation Category 2A , Flammable liquids Category 3 , Specific target organ toxicity – single exposure Category 3

StorageWorking volumes in amber bottles, stored in primary litho area; stock bottle in Cabinet 14 (flammables fridge)
DisposalSolid: Organic waste / organic sharps waste containers in primary or secondary litho areas.  Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A.
CommentsHandle and process as AZ P4620.

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Please contact a nanoFAB staff member for uses not listed above.