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ProductAZ 5214E photoresist

EMD Performance Materials Corp.

Composition70–75% 1-Methoxy-2-propanol acetate, 1–5% Diazonaphthoquinonesulfonic ester, <0.3% 2-Methoxy-1-propanol acetate20–25% Cresol novolak resin, <2% Phenolic compound; liquid
Typical UsesImage-reversal photoresist for broadband and g/h/i-line exposure

2 0 2   Flammable Less serious health effects

Serious eye damage/eye irritation Category 2A , Flammable liquids Category 3 , Specific target organ toxicity – single exposure Category 3

StorageWorking volumes in amber bottles, stored in primary litho area; stock bottles in resist fridge outside W1-040
DisposalSolid: Organic waste / organic sharps waste containers in primary or secondary litho areas.  Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A.


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Please contact a nanoFAB staff member for uses not listed above.