ProductAZ 300 MIF Developer
ManufacturerEMD Performance Materials Corp
Composition>95% water, <3% tetramethylammonium hydroxide; liquid
Typical UsesMetal-ion free developer for photolithography (surfactant free)

2 0 0 Corrosive Less serious health effects

Corrosive to metals Category 1 ,  Skin corrosion/irritation Category 2 ,  Serious eye damage/eye irritation Category 2A , Acute toxicity Category 4 (oral)

StorageCabinet 13 (bases cabinet in Wet Aisle 1); underneath litho wet decks
DisposalPour into wet deck (Developer Station #1/#2, Wet Deck 1A/1B/2A) and rinse copiously with DI water.
CommentsLogin to tool Developer Station #1 - TMAH or Developer Station #2 - TMAH when using.  Wear PPE when handling:  chemical-resistant gloves, acid apron, face shield.

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Please contact a nanoFAB staff member for uses not listed above.

Additional information