| Product | AZ 300 MIF Developer |
|---|---|
| Manufacturer | EMD Performance Materials Corp |
| Composition | >95% water, <3% tetramethylammonium hydroxide; liquid |
| Synonyms | |
| Typical Uses | Metal-ion free developer for photolithography (surfactant free) |
| Hazards | 
Corrosive to metals Category 1
,
Skin corrosion/irritation Category 2
,
Serious eye damage/eye irritation Category 2A
,
Acute toxicity Category 4
(oral) |
| Storage | Cabinet 13 (bases cabinet in Wet Aisle 1); underneath litho wet decks |
| Disposal | Pour into wet deck (Developer Station #1/#2, Wet Deck 1A/1B/2A) and rinse copiously with DI water. |
| Comments | Login to tool Developer Station #1 - TMAH or Developer Station #2 - TMAH when using. Wear PPE when handling: chemical-resistant gloves, acid apron, face shield. |
| Status |
Check First
Please contact a nanoFAB staff member for uses not listed above.
Additional information
- Technical data sheet: TDS - AZ MIF developers.pdf