| Product | AZ 1529 photoresist |
|---|---|
| Manufacturer | EMD Performance Materials Corp. |
| Composition | 65–70% 1-Methoxy-2-propanol acetate, 5–10% Diazonaphthoquinonesulfonic ester, 0 - 0.3% 2-Methoxy-1-propanol acetate, 25–30% Cresol novolak resin; liquid |
| Synonyms | |
| Typical Uses | Positive-tone photoresist for broadband and g/h/i-line exposure |
| Hazards |
Serious eye damage/eye irritation Category 2A Flammable liquids Category 3 Specific target organ toxicity – single exposure Category 3 |
| Storage | Working volumes in amber bottles, stored in primary litho area; stock bottles in resist fridge outside W1-040 |
| Disposal | Solid: Organic waste / organic sharps waste containers in primary or secondary litho areas. Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A. |
| Comments | Standard recipe yields ~3.4 µm resist thickness. |
| Status | STOCKED |
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