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ProductAZ 1529 photoresist

EMD Performance Materials Corp.

Composition65–70% 1-Methoxy-2-propanol acetate, 5–10% Diazonaphthoquinonesulfonic ester, 0 - 0.3% 2-Methoxy-1-propanol acetate25–30% Cresol novolak resin; liquid
Typical UsesPositive-tone photoresist for broadband and g/h/i-line exposure

2 0 2   Flammable Less serious health effects

Serious eye damage/eye irritation Category 2A

Flammable liquids Category 3

Specific target organ toxicity – single exposure Category 3

StorageWorking volumes in amber bottles, stored in primary litho area; stock bottles in resist fridge outside W1-040
DisposalSolid: Organic waste / organic sharps waste containers in primary or secondary litho areas.  Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A.
CommentsStandard recipe yields ~3.4 µm resist thickness.


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