ProductAQM SiOx
ManufacturerApplied Quantum Materials Inc.

100% hydrogen silsesquioxane based polymer; solid

Typical UsesElectron-beam lithography resist; spin-on glass

0 0 0

Not regarded as hazardous.

StorageCabinet 6 (flammables cabinet in Wet Aisle 2)
DisposalSolid: Organic waste / organic sharps waste buckets under Aisle 1 fumehood, red waste pail in primary litho.  Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A.  
CommentsMaterial is hygroscopic:  store in tightly closed container, under inert atmosphere or vacuum, at room temperature.  Mixed with MIBK to form solution for EBL resist.


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Please contact a nanoFAB staff member for uses not listed above.