Overview

Deposition sources are isolated to reduce thermal effects and cross contamination. The Covap PVD platform is equipped with a complete set of removable chamber shielding to ensure the chamber can be easily cleaned and maintained. Source and stage power, as well as pneumatic pressure are cut while the chamber is open, ensuring the highest level of safety. It can be integrated into a glovebox or selected in a standalone configuration.

LMACS NameOrganics Evaporator (Angstrom Covap III)
Confluence Labelangstrom-covap-thermal-evaporator
Process Area

Deposition

ModelCovap III
VendorAngstrom Engineering
Team

Timothy Harrison Aaron Hryciw Glenn Elaschuk





 

System Features

Features

4 source configuration

Recipe based multi-layer control
QCM for each source
Substrate rotation
supports substrates up to 100mm x 100mm

Documents

Operating Procedure


Hazard AssessmentOrganics Evaporator (Angstrom Covap III) HA

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